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MFA in Photography

International Low-Residency MFA in Photography


The limited-residency Master of Fine Arts in Photography is specifically designed to meet the needs of practicing photographers seeking the terminal degree in the discipline while maintaining active, full-time, professional careers. The mentor-guided program structure requires two academic years (four semesters) and three summers to complete. Students are expected to be in residence at the University for intensive, two-week summer sessions and at one-week, off-campus residencies in selected cities in the United States and abroad during both the fall and spring semesters. Off-campus host cities are carefully chosen for their proximity to major photography institutions, practicing artists and professionals in the field. Currently scheduled off-campus locations include New York City and Berlin, Germany. During the nonresident portions of the program, students maintain ongoing contact with the program director, their thesis advisor, and faculty through the use of online, fax, telephone, and other means. Thus, the limited-residency structure of the program provides nontraditional, working students the opportunity to complete a professional, terminal degree while simultaneously continuing to meet employment and family obligations.